Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film
US7498393B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Jan 25, 2007 |
| Grant date | Mar 3, 2009 |
| Priority date | — |
| Expiry date | Jan 25, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer, wherein the fluoropolymer has monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1):CF2═CFCF2C(CF3)(OR1)—(CH2)nCR2═CHR3 (1)
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.