Measurement method and apparatus, exposure apparatus, exposure method, and adjusting method
US7499179B2 · kind B2 · utility
2Cited by
6References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 30, 2007 |
| Grant date | Mar 3, 2009 |
| Priority date | — |
| Expiry date | Nov 13, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70591
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A measurement method for measuring a position of an aperture stop in an optical system includes the steps of measuring a light intensity distribution of light that passes the aperture stop, at a position that is optically conjugate with a pupil position in the optical system, and determining a position of the aperture stop in the optical system based on a diffraction fringe of the light intensity distribution measured by the measuring step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.