Dual hemispherical collectors
US7501641B2 · kind B2 · utility
7Cited by
21References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2006 |
| Grant date | Mar 10, 2009 |
| Priority date | — |
| Expiry date | Apr 10, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70175
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second surface shaped to reflect radiation in the second hemisphere of the source to an output plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.