Multiple frequency plasma chamber, switchable RF system, and processes using same
US7503996B2 · kind B2 · utility
21Cited by
1References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2007 |
| Grant date | Mar 17, 2009 |
| Priority date | — |
| Expiry date | Apr 25, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H11/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An RF power supplier is provided, that enables multiple-frequency RF power. The system uses N RF signal generators, combines the RF signals, amplify the combined signals, and then separates the amplified signal. The output of the system is then a multiple-frequency RF power. Optionally, the frequencies are switchable, so that one may select which frequencies the system outputs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.