Method and algorithms for inspection of longitudinal defects in an eddy current inspection system
US7505859B2 · kind B2 · utility
1Cited by
8References
11Claims
0Family size
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Key dates
| Filing date | Apr 5, 2007 |
| Grant date | Mar 17, 2009 |
| Priority date | — |
| Expiry date | Apr 5, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/90
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A collection of data processing algorithms which, used in concert, are suitable for use in place of a high pass filter stage in an eddy current inspection system and provide for a system optimized to inspect test pieces for elongated defects running parallel to the scan axis. The algorithms use mathematical techniques to eliminate baseline impedance offset between test pieces, correct for offset drift during a scan, and allow for system balancing using only a set of test pieces of unknown quality.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.