Cleaning method and cleaning apparatus
US7507297B2 · kind B2 · utility
2Cited by
4References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 2003 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | May 12, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering substances adhering to at least the surface of the recess structure of the component that has the recess structure, cleaning is carried out by using the supercritical gas or the liquefied gas so that the cleaning medium spreads over the surface of the recess structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.