Multiple exposure apparatus and multiple exposure method using the same
US7518704B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 13, 2006 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | Mar 30, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70125
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multiple exposure system and a multiple exposure method using the same enhance the resolution of the image of the mask pattern transferred to a substrate. The system includes NA controllers that provide excellent resolution with respect to the directions of the short axis and long axis of the mask pattern. In one form of the method, a first exposure process is performed using a first NA controller that provides excellent resolution with respect to the direction of the short axis of the mask pattern and subsequently, a second exposure process is performed using a second NA controller that provides excellent resolution with respect to the direction of the long axis of the mask pattern. Alternatively, the first exposure process and the second or high order exposure process can be sequentially performed using the first and second NA controllers simultaneously.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.