Inventor · Seongnam-si, KR

Joon-soo Park

24Patents
8h-index
39Co-inventors
75Inventor score

Filing activity: Apr 5, 1985 → Apr 19, 2017

Most-cited inventions

PatentTitleAreaCited byStatus
US7842601B2 Method of forming small pitch pattern using double spacers Electricity 35 Active
US6522351B1 Stereoscopic image display apparatus using a single projector Electricity 17 Expired
US5867320A Lens unit for projector Electricity 17 Expired
US8003543B2 Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same Electricity 17 Active
US8278221B2 Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same Electricity 14 Active
US7732341B2 Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same Electricity 12 Active
US7473647B2 Method of forming pattern using fine pitch hard mask Electricity 11 Active
US8785319B2 Methods for forming fine patterns of a semiconductor device Electricity 9 Active
US8614148B2 Methods for forming fine patterns of a semiconductor device Electricity 8 Active
US6716746B1 Semiconductor device having self-aligned contact and method of fabricating the same Electricity 7 Expired
US7732279B2 Semiconductor device with improved overlay margin and method of manufacturing the same Electricity 6 Active
US4635377A T-square apparatus Physics 5 Expired
US7205241B2 Method for manufacturing semiconductor device with contact body extended in direction of bit line Emerging Cross-Sectional Technologies 5 Expired
US6960414B2 Multi-exposure lithography method and system providing increased overlay accuracy Physics 3 Expired
US7414279B2 Semiconductor device with improved overlay margin and method of manufacturing the same Electricity 3 Expired
US8062981B2 Method of forming pattern using fine pitch hard mask Electricity 2 Active
US7518704B2 Multiple exposure apparatus and multiple exposure method using the same Physics 2 Active
US7463333B2 Multi-exposure lithography system providing increased overlay accuracy Physics 1 Expired
US10276373B2 Method of manufacturing a semiconductor device Electricity 1 Active
US8034684B2 Semiconductor device with improved overlay margin and method of manufacturing the same Electricity 1 Active
US7879726B2 Methods of forming semiconductor devices using selective etching of an active region through a hardmask Electricity 0 Active
US10553438B2 Semiconductor device and method for fabricating the same Electricity 0 Active
US7550383B2 Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same Physics 0 Active
US11473079B2 Method for prenatal diagnosis using digital PCR Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.