X-ray metrology with diffractors
US7519153B1 · kind B1 · utility
9Cited by
9References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 24, 2006 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | Sep 28, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2561
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An electron probe microanalysis (EPMA) system includes a graded multilayer diffractor for tightly focusing output x-rays onto an x-ray detector. The graded multilayer construction of the diffractor allows a high x-ray flux to be generated in a small measurement spot, which results in a high measurement throughput. The enhanced measurement efficiency provided by the graded multilayer diffractor can allow an EPMA system to be used as an in-line monitoring tool. The graded multilayer diffractor can include multiple reflecting surfaces. Multiple graded multilayer diffractors can also be used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.