Apparatus and method for cleaning and drying a container for semiconductor workpieces
US7520286B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 5, 2005 |
| Grant date | Apr 21, 2009 |
| Priority date | — |
| Expiry date | Apr 9, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/14
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides an apparatus for cleaning and drying a container for semiconductor workpieces. The apparatus comprises a load port with a fixture that receives a dirty container and delivers it to a deck assembly with a carrier that removably receives the container for further handling. While the container is received by the carrier, a robot with a first end effector removes the container door and places it on a portion of the carrier. The robot includes a second end effector that engages the carrier and elevates the carrier and container for insertion into a process chamber. The process chamber includes a rotor with at least one receptacle wherein the rotor is rotated to create both high pressure and low pressure regions. Once the container and carrier are loaded into the rotor, the rotor is rotated and means for cleaning injects a processing fluid onto the container and carrier. After a rinse stage and while the rotor is rotating, the means for drying delivers air across the container and carrier. Upon completion of the drying stage, the robot removes both the container and the carrier from the process chamber and reassembles the door to the container such that container c…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.