Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment
US7524595B2 · kind B2 · utility
0Cited by
2References
7Claims
0Family size
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Key dates
| Filing date | Sep 8, 2005 |
| Grant date | Apr 28, 2009 |
| Priority date | — |
| Expiry date | Jul 20, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/151
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming an anti-reflection coating (ARC) with no hole over an overlay mark is described, which applies a fluid material of the ARC onto a substrate and then conducts at least two curing steps to convert the fluid material into the ARC. Such a bottom anti-reflection coating with no hole over the overlay mark can improve accuracy of the overlay measurement of lithography, thereby improving the alignment accuracy of the lithography process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.