Applications of semiconductor nano-sized particles for photolithography
US7524616B2 · kind B2 · utility
5Cited by
10References
25Claims
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Key dates
| Filing date | Mar 4, 2004 |
| Grant date | Apr 28, 2009 |
| Priority date | — |
| Expiry date | Oct 25, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/004
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.