Method and apparatus for removing a liquid from a surface of a substrate
US7527698B2 · kind B2 · utility
3Cited by
24References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 6, 2003 |
| Grant date | May 5, 2009 |
| Priority date | — |
| Expiry date | Mar 26, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The rotary movement has a center of rotation and an edge of rotation. The second liquid is directed from the center of rotation to the edge of rotation using a nozzle. A dry zone is created on the substrate as the position of the spray moves from the center of rotation to the edge of rotation. As a result, the first liquid and the second liquid are removed from the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.