Salt suitable for an acid generator and a chemically amplified resist composition containing the same
US7527910B2 · kind B2 · utility
2Cited by
10References
31Claims
0Family size
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Key dates
| Filing date | Dec 26, 2006 |
| Grant date | May 5, 2009 |
| Priority date | — |
| Expiry date | Apr 11, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a salt of the formula (I):wherein X represents alkylene group or substituted alkylene group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows 0 or 1.The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I), and a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.