Optical proximity correction in raster scan printing based on corner matching templates
US7529421B2 · kind B2 · utility
2Cited by
16References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 1, 2004 |
| Grant date | May 5, 2009 |
| Priority date | — |
| Expiry date | Aug 15, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/20164
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Methods and apparatus for correcting defects, such as rounded corners and line end shortening, in patterns formed via lithography are provided. Such defects are compensated for “post-rasterization” by manipulating the grayscale values of pixel maps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.