Patent · US Active

Magnet arrangement for a planar magnetron

US7531071B2 · kind B2 · utility

3Cited by

8References

11Claims

0Family size

Assignee

Applied Materials GmbH & Co. KG · DE

Inventors

Thomas DEPPISCH · Aschaffenburg, DE
Andreas Lopp · Neuses, DE

Key dates

Filing date	Mar 20, 2006
Grant date	May 12, 2009
Priority date	—
Expiry date	Jun 22, 2026

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3408
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A magnetic arrangement for a planar magnetron, in which an initial magnetic pole encompasses a second magnetic pole. This magnetic arrangement is moved linear in longitudinal direction to a target by a specific value and then moved back in opposite direction by the same value. In one version, an additional perpendicular motion is effected. The magnet arrangement is designed so that north and south pole interlock and waviform racetracks are generated. This enables constant sputtering from the entire target surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.