Salt suitable for an acid generator and a chemically amplified resist composition containing the same
US7531686B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2006 |
| Grant date | May 12, 2009 |
| Priority date | — |
| Expiry date | Feb 10, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a salt of the formula (I):wherein ring X represents polycyclic hydrocarbon group having tricycle or more and having 10 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; n shows an integer of 1 to 12; and A+ represents a cation selected from the group consist of a cation of the following formulae (IIa), (IIb) and (IIc):The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.