Conductor structures including penetrable materials
US7534967B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 24, 2004 |
| Grant date | May 19, 2009 |
| Priority date | — |
| Expiry date | May 16, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/28562
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Conductor structures include a substrate, a first conducting layer that is selectively passivated from growth of unwanted surface layers by the application of a selective passivation layer, and a second conducting layer that is applied onto the selective passivation layer. The selective passivation layer prevents the combination of unwanted materials with the first conducting layer while allowing the combination of the applied second conducting layer with the first conducting layer. The selective passivation layer is displaced by the second conducting layer and remains as a passivation layer on the exposed surface of the second conducting layer being displaced, thereby protecting the first and second conducting layers from unwanted materials or unwanted surface layers. Methods of fabricating conductor structures are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.