Method and system for focusing a charged particle beam
US7535001B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 25, 2007 |
| Grant date | May 19, 2009 |
| Priority date | — |
| Expiry date | Nov 12, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/216
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for focusing a charged particle beam, the method includes: (a) altering a focal point of a charged particle beam according to a first focal pattern while scanning a first area of a sample and collecting a first set of detection signals; (b) altering a focal point of a charged particle bean according to a second focal pattern while scanning a second area that is ideally identical to the first area and collecting a second set of detection signals; and (c) processing the first and second set of detection signals to determine a focal characteristic; whereas the first focal pattern and the second focal pattern differ by the location of an optimal focal point.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.