Nanometer-level mix-and-match scanning tip and electron beam lithography using global backside position reference marks
US7535581B2 · kind B2 · utility
2Cited by
6References
20Claims
0Family size
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Key dates
| Filing date | Sep 6, 2007 |
| Grant date | May 19, 2009 |
| Priority date | — |
| Expiry date | Sep 6, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3174
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An interferometric-spatial-phase imaging (ISPI) system includes a substrate wafer. An alignment configuration is permanently embedded in the substrate wafer. The alignment configuration uses a global coordinate reference system by providing a plurality of global reference marks that encompass up to the entire substrate wafer. A plurality of alignment markings is provided on a surface in close proximity to the alignment configuration for obtaining continuous six-axis control to provide positional information of a scanning probe tip or an electron beam with respect to said global coordinate reference system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.