Lithographic apparatus and device manufacturing method utilizing a substrate handler
US7538857B2 · kind B2 · utility
4Cited by
23References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 21, 2005 |
| Grant date | May 26, 2009 |
| Priority date | — |
| Expiry date | Jun 27, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.