Pattern recognition matching for bright field imaging of low contrast semiconductor devices
US7538868B2 · kind B2 · utility
3Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2005 |
| Grant date | May 26, 2009 |
| Priority date | — |
| Expiry date | Jan 4, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Calibration of pattern recognition in bright field imaging systems is disclosed. A target pattern on a substrate on the stage is brought into focus of a bright field system. The image is scanned in a first direction while measuring an edge scattering pattern from a feature of the target pattern. The edge scattering pattern is characterized by first and second peaks. A position of the bright field system's illuminator or beam shaping and relay optics is adjusted perpendicular to an optical path until the first and second peaks are approximately equal in height.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.