Radiation system and lithographic apparatus comprising the same
US7541603B2 · kind B2 · utility
4Cited by
1References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2006 |
| Grant date | Jun 2, 2009 |
| Priority date | — |
| Expiry date | Feb 2, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/15
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.