Electrode assembly for plasma processing apparatus
US7543547B1 · kind B1 · utility
20Cited by
26References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2003 |
| Grant date | Jun 9, 2009 |
| Priority date | — |
| Expiry date | Jan 31, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/4921
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrode assembly for a plasma processing apparatus includes a backing member secured to an electrode. First fastener members mounted in apertures in the backing member cooperate with second fastener members to hold the electrode assembly to a support member, such as a temperature-controlled top plate in a plasma processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.