Patent · US Active

Method of fabricating nanodevices

US7544523B2 · kind B2 · utility

13Cited by
10References
35Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 28, 2006
Grant dateJun 9, 2009
Priority date
Expiry dateJun 13, 2026

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/857
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic “modules” which can be easily manipulated and shaped to fit standard mounts in various devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.