Uniformity correction system having light leak and shadow compensation
US7545585B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 25, 2006 |
| Grant date | Jun 9, 2009 |
| Priority date | — |
| Expiry date | Jul 25, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method for uniformity correction having light leak and shadow compensation is provided. The system includes multiple correction elements and an optical compensation plate. Adjacent correction elements are separated by a gap. The optical compensation plate includes a pattern having multiple gap compensation segments. The pattern has an attenuation which is different than the attenuation of the remaining portions of the optical compensation plate. The location of each compensation segment on the compensation plate corresponds to the location of the corresponding gap between adjacent correction elements in the illumination slot. The width of each compensation segment is dependent upon the angle of the light incident on the correction system. The pattern can be located on the top surface or on the bottom surface of the compensation plate. In addition, the compensation plate can be located above or below the plurality of correction elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.