Patent · US Active

Defect identification system and method for repairing killer defects in semiconductor devices

US7547560B2 · kind B2 · utility

4Cited by
5References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 12, 2006
Grant dateJun 16, 2009
Priority date
Expiry dateDec 14, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/76892
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method for improving semiconductor yield by in-line repair of defects during manufacturing comprises inspecting dies on a wafer after a selected layer is formed on the dies, identifying defects in each of the dies, classifying the identified defects as killer or non-critical, for each killer defect determining an action to correct the defect, repairing the defect and returning the wafer to a next process step. Also disclosed is a method for determining an efficient repair process by dividing the die into a grid and using analysis of the grid to find a least invasive repair.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.