Patent · US Active

System and method for generating ions and radicals

US7550927B2 · kind B2 · utility

1Cited by

6References

13Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Michael W. Stowell · Sunnyvale, US
Guenter Klemm · Nidda, DE
Hans-Georg Lotz · Grundau, DE
Volker Hacker · Schongau, DE

Key dates

Filing date	Nov 9, 2006
Grant date	Jun 23, 2009
Priority date	—
Expiry date	Aug 17, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32366
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A system and method for producing electrons and ions are disclosed. One embodiment includes an outer electrode with a discharge chamber; an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the discharge chamber and a lower portion of the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber; wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.