Apparatus and reactor for generating and feeding high purity moisture
US7553459B2 · kind B2 · utility
5Cited by
15References
31Claims
0Family size
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Key dates
| Filing date | Jul 26, 2006 |
| Grant date | Jun 30, 2009 |
| Priority date | — |
| Expiry date | Dec 24, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B5/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.