Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

US7554094B2 · kind B2 · utility

Assignees

• Carl Ziess SMT AG · DE
• Applied Materials Israel Ltd. · IL

Inventors

• Rainer Knippelmeyer · Utting am Ammersee, DE
• Oliver Kienzle · Aalen, DE
• Thomas Kemen · Meppen, DE
• Heiko Mueller · Heidelberg, DE
• Stephan Uhlemann · Heidelberg, DE
• Maximilian Haider · Gaiberg, DE
• Antonio Casares · Aalen, DE

Key dates

• Filing date: Jun 13, 2007
• Grant date: Jun 30, 2009
• Expiry date: Nov 14, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/31774
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.