Lithographic apparatus and device manufacturing method
US7554105B2 · kind B2 · utility
4Cited by
12References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2005 |
| Grant date | Jun 30, 2009 |
| Priority date | — |
| Expiry date | Jan 14, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.