Patent · US Active

Micromechanical device having two sensor patterns

US7555956B2 · kind B2 · utility

10Cited by

6References

6Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Hubert Benzel · Neckartenzlingen, DE
Christoph Schelling · Stuttgart, DE

Key dates

Filing date	Jul 13, 2006
Grant date	Jul 7, 2009
Priority date	—
Expiry date	Oct 28, 2026

Classification

Technology area (CPC G)Physics
CPC primaryG01L19/0092
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A micromechanical device and a method for producing this device are provided, two sensor patterns being provided in the semiconductor material to record two mechanical variables, in particular the pressure and the acceleration. The functionality of both sensor patterns is based on the same predefined converter principle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.