Optical semiconductor device with multiple quantum well structure
US7556974B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2006 |
| Grant date | Jul 7, 2009 |
| Priority date | — |
| Expiry date | Oct 19, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/3408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical semiconductor device with a multiple quantum well structure, in which well layers and barrier layers comprising various types of semiconductor layers are alternately layered, in which device well layers (6a) of a first composition based on a nitride semiconductor material with a first electron energy and barrier layers (6b) of a second composition of a nitride semiconductor material with electron energy which is higher in comparison with the first electron energy are provided, followed, seen in the direction of growth, by a radiation-active quantum well layer (6c), for which the essentially non-radiating well layers (6a) and the barrier layers (6b) arranged in front form a superlattice.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.