Lithographic apparatus and device manufacturing method
US7557901B2 · kind B2 · utility
6Cited by
23References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2006 |
| Grant date | Jul 7, 2009 |
| Priority date | — |
| Expiry date | May 7, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.