Patent · US Expired

Sealing porous dielectric materials

US7560165B2 · kind B2 · utility

1Cited by
11References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 7, 2005
Grant dateJul 14, 2009
Priority date
Expiry dateJun 7, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31663
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Method and structure for minimizing the downsides associated with microelectronic device processing adjacent porous dielectric materials are disclosed. In particular, chemical protocols are disclosed wherein porous dielectric materials may besealed by attaching coupling agents to the surfaces of pores. The coupling agents may form all or part of caps on reactive groups in the dielectric surface or may crosslink to seal pores in the dielectric.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.