Robert Meagley
44Patents
9h-index
31Co-inventors
71Inventor score
Filing activity: Oct 9, 2001 → Aug 29, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6566280B1 | Forming polymer features on a substrate | Electricity | 197 | Expired |
| US7241707B2 | Layered films formed by controlled phase segregation | Physics | 20 | Expired |
| US7259109B2 | Electrospray and enhanced electrospray deposition of thin films on semiconductor substrates | Performing Operations; Transporting | 19 | Expired |
| US7374867B2 | Enhancing photoresist performance using electric fields | Physics | 19 | Expired |
| US7169715B2 | Forming a dielectric layer using porogens | Electricity | 12 | Expired |
| US6833320B2 | Removing sacrificial material by thermal decomposition | Electricity | 9 | Expired |
| US7344972B2 | Photosensitive dielectric layer | Electricity | 9 | Expired |
| US7018920B2 | Composite sacrificial material | Electricity | 9 | Expired |
| US7678527B2 | Methods and compositions for providing photoresist with improved properties for contacting liquids | Physics | 9 | Expired |
| US6858528B2 | Composite sacrificial material | Electricity | 9 | Expired |
| US6991893B2 | Controlling resist profiles through substrate modification | Physics | 7 | Expired |
| US7071125B2 | Precursors for film formation | Electricity | 7 | Expired |
| US7192686B2 | Photoacid generators based on novel superacids | Emerging Cross-Sectional Technologies | 6 | Expired |
| US10083883B2 | Wafer processing equipment having capacitive micro sensors | Physics | 6 | Active |
| US7135419B2 | Line edge roughness reduction | Electricity | 5 | Expired |
| US6872513B2 | Photoresist edge correction | Physics | 5 | Expired |
| US6908717B2 | Positive photosensitive resin composition, process for its preparation, and semiconductor devices | Physics | 4 | Expired |
| US7101798B2 | Method to modulate etch rate in SLAM | Electricity | 4 | Expired |
| US7241560B2 | Basic quencher/developer solutions for photoresists | Physics | 3 | Expired |
| US7214452B2 | Using perfluoropoly-ethers to form pellicles | Emerging Cross-Sectional Technologies | 3 | Expired |
| US6872505B1 | Enabling chain scission of branched photoresist | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7084053B2 | Unidirectionally conductive materials for interconnection | Electricity | 2 | Expired |
| US7875415B2 | Helical pixilated photoresist | Physics | 2 | Expired |
| US7572732B2 | Method to modulate etch rate in SLAM | Electricity | 2 | Active |
| US7560165B2 | Sealing porous dielectric materials | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.