Method of forming uniform features using photoresist
US7560225B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2003 |
| Grant date | Jul 14, 2009 |
| Priority date | — |
| Expiry date | Apr 25, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/102
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A process for ion milling using photoresist as a mask is described. In a preferred embodiment the invention is used in the fabricating air-bearing features on sliders for use in magnetic storage devices. According to the invention the photoresist (liquid or dry) is applied, developed and removed as in the prior art which includes baking steps. The embodiment of the invention includes an additional baking step beyond whatever baking steps are used in the photolithography process. The additional baking step is preferably performed immediately prior to ion milling. The additional baking step according to the invention yields increased uniformity of the depth of the ion milling which is believed to result from reduction of volatile material such as water in the photoresist. When the invention is used as part of the manufacturing process for ion milling the air-bearing features on a slider, the features are more uniform which improves the overall quality and performance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.