Diana Perez
7Patents
3h-index
16Co-inventors
46Inventor score
Filing activity: Jun 5, 1997 → Dec 2, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6132632A | Method and apparatus for achieving etch rate uniformity in a reactive ion etcher | Electricity | 14 | Expired |
| US6001268A | Reactive ion etching of alumina/TiC substrates | Physics | 9 | Expired |
| US6027660A | Method of etching ceramics of alumina/TiC with high density plasma | Physics | 8 | Expired |
| US7560225B2 | Method of forming uniform features using photoresist | Physics | 3 | Expired |
| US6051099A | Apparatus for achieving etch rate uniformity | Electricity | 2 | Expired |
| US7481312B2 | Direct cooling pallet assembly for temperature stability for deep ion mill etch process | Electricity | 1 | Active |
| US7296420B2 | Direct cooling pallet tray for temperature stability for deep ion mill etch process | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.