Method for adjoining adjacent coatings on a processing element
US7560376B2 · kind B2 · utility
34Cited by
145References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2004 |
| Grant date | Jul 14, 2009 |
| Priority date | — |
| Expiry date | Feb 12, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68757
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Two or more coatings applied to processing elements of a plasma processing system are treated with protective barriers or coatings. A method is described for adjoining two or more coatings on the processing element. Having applied a first protective barrier, a portion of the first protective barrier is treated. A second protective barrier is then applied over at least a portion of a region to which the first protective barrier was applied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.