Immersion exposure technique
US7561248B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 31, 2007 |
| Grant date | Jul 14, 2009 |
| Priority date | — |
| Expiry date | Jan 22, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus which has a projection optical system and exposes a substrate to a pattern of an original via the projection optical system with a gap between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle having a supply port to supply the liquid to the gap through the supply port, the supply port arranged on a first opposite surface to an exposed surface of the substrate, a recovery nozzle having a recovery port to recover the liquid through the recovery port, arranged more distant than the supply port from a final surface of the projection optical system, the recovery port arranged so as to oppose the exposed surface of the substrate, and a stepped portion having a second opposite surface to the exposed surface of the substrate. A distance between the second opposite surface and the exposed surface of the substrate is different from a distance between the first opposite surface and the exposured surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.