Method for separating a useful layer and component obtained by said method

US7569152B2 · kind B2 · utility

Assignee

• COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

• Hubert Grange · Grenoble, FR
• Bernard Diem · Échirolles, FR
• Sylvie Viollet Bosson · Le Pont-de-Claix, FR
• Michel Borel · Chambéry, FR

Key dates

• Filing date: Jul 1, 2004
• Grant date: Aug 4, 2009
• Expiry date: Jun 28, 2026

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81C2201/115
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A useful layer (1) is initially attached by a sacrificial layer (2) to a layer (3) forming a substrate. Before etching of the sacrificial layer (2), at least a part of the surface (4, 5) of at least one of the layers in contact with the sacrificial layer (2) is doped. After etching of the sacrificial layer (2), the surface (4, 5) is superficially etched so as to increase the roughness of its doped part. After doping, a mask (9) is deposited on a part of the useful layer (1) so as to delineate a doped zone and a non-doped zone of the surface (4, 5), one of the zones forming a stop after the superficial etching phase.