Methods of making a MEMS device by monitoring a process parameter
US7569488B2 · kind B2 · utility
44Cited by
101References
71Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 22, 2007 |
| Grant date | Aug 4, 2009 |
| Priority date | — |
| Expiry date | Jun 22, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0138
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Embodiments of the present invention relate to methods and systems for making a microelectromechanical system MEMS device comprising supplying an etchant to etch one or more sacrificial structures of the system in a chamber. A process parameter relating to the pressure within the chamber is monitored as a function of time to provide an indication of the extent of the etching of the one or more sacrificial structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.