Supporting plate, stage device, exposure apparatus, and exposure method
US7573560B2 · kind B2 · utility
7Cited by
17References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 23, 2007 |
| Grant date | Aug 11, 2009 |
| Priority date | — |
| Expiry date | May 23, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus exposes a pattern onto a substrate. The exposure apparatus includes a supporting plate having a surface, a substrate stage which holds the substrate and is movable over the supporting plate, a liquid supply device having a supply nozzle which supplies liquid to the substrate, a first collection device which collects the liquid directly from the substrate, and a second collection device which collects liquid which has been discharged to the supporting plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.