Substrate handler, lithographic apparatus and device manufacturing method
US7576835B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 2005 |
| Grant date | Aug 18, 2009 |
| Priority date | — |
| Expiry date | Jul 27, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7075
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.