Electrostatic chuck
US7576967B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2007 |
| Grant date | Aug 18, 2009 |
| Priority date | — |
| Expiry date | Mar 19, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6831
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electrostatic chuck includes a ceramic base having an electrode embedded in vicinity to a holding face for holding a substrate. On a back side of this ceramic base, provided are a terminal connected to the electrode, a wafer temperature control member, and an insulating member for insulating the temperature control member from the terminal. This insulating member has a flange portion on its end portion in contact with the ceramic base, and is made of highly thermal conductive ceramics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.