Patent · US Active

Electrostatic chuck

US7576967B2 · kind B2 · utility

1Cited by
6References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 19, 2007
Grant dateAug 18, 2009
Priority date
Expiry dateMar 19, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/6831
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An electrostatic chuck includes a ceramic base having an electrode embedded in vicinity to a holding face for holding a substrate. On a back side of this ceramic base, provided are a terminal connected to the electrode, a wafer temperature control member, and an insulating member for insulating the temperature control member from the terminal. This insulating member has a flange portion on its end portion in contact with the ceramic base, and is made of highly thermal conductive ceramics.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.