Method and system for logic design for cell projection particle beam lithography
US7579606B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 1, 2006 |
| Grant date | Aug 25, 2009 |
| Priority date | — |
| Expiry date | Oct 17, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/20
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for particle beam lithography, such as electron beam (EB) lithography, includes predefining a stencil design having a plurality of cell patterns with information from a cell library, fabricating the stencil design, synthesizing a functional description into a logic circuit design after predefining the stencil design so that one or more characteristics of the stencil design are considered during synthesizing of the functional description into the logic circuit design, optimizing the logic circuit design, generating a layout design from the optimized logic circuit design, and forming the logic circuit on a substrate according to the stencil design and the layout design.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.