Patent assignee · US · COMPANY

D2S, Inc.

118Patents
118Active
118Granted
62Portfolio score

Filing activity: Sep 15, 2005 → May 7, 2024 · 26 expiring within 5 years

Most-cited patents

PatentTitleAreaCited byStatus
US7901850B2 Method and system for design of a reticle to be manufactured using variable shaped beam lithography Emerging Cross-Sectional Technologies 61 Active
US7754401B2 Method for manufacturing a surface and integrated circuit using variable shaped beam lithography Emerging Cross-Sectional Technologies 56 Active
US7759027B2 Method and system for design of a reticle to be manufactured using character projection lithography Emerging Cross-Sectional Technologies 41 Active
US8137871B2 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area Emerging Cross-Sectional Technologies 34 Active
US8473875B2 Method and system for forming high accuracy patterns using charged particle beam lithography Physics 30 Active
US7799489B2 Method for design and manufacture of a reticle using variable shaped beam lithography Emerging Cross-Sectional Technologies 28 Active
US8039176B2 Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography Emerging Cross-Sectional Technologies 28 Active
US8062813B2 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography Emerging Cross-Sectional Technologies 26 Active
US8501374B2 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography Emerging Cross-Sectional Technologies 23 Active
US8828628B2 Method and system for design of a reticle to be manufactured using variable shaped beam lithography Emerging Cross-Sectional Technologies 19 Active
US7759026B2 Method and system for manufacturing a reticle using character projection particle beam lithography Emerging Cross-Sectional Technologies 18 Active
US8221939B2 Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages Emerging Cross-Sectional Technologies 18 Active
US8354207B2 Method, device, and system for forming circular patterns on a surface Emerging Cross-Sectional Technologies 18 Active
US8900778B2 Method for forming circular patterns on a surface Emerging Cross-Sectional Technologies 17 Active
US8719739B2 Method and system for forming patterns using charged particle beam lithography Physics 16 Active
US8304148B2 Method and system for design of a reticle to be manufactured using variable shaped beam lithography Emerging Cross-Sectional Technologies 15 Active
US8938696B1 Techniques of optical proximity correction using GPU Emerging Cross-Sectional Technologies 15 Active
US8202673B2 Method for manufacturing a surface and integrated circuit using variable shaped beam lithography Emerging Cross-Sectional Technologies 15 Active
US8017289B2 Method for manufacturing a surface and integrated circuit using variable shaped beam lithography Emerging Cross-Sectional Technologies 15 Active
US8202672B2 Method and system for design of a reticle to be manufactured using variable shaped beam lithography Emerging Cross-Sectional Technologies 15 Active
US7579606B2 Method and system for logic design for cell projection particle beam lithography Physics 14 Active
US7745078B2 Method and system for manufacturing a reticle using character projection lithography Emerging Cross-Sectional Technologies 14 Active
US9043734B2 Method and system for forming high accuracy patterns using charged particle beam lithography Physics 13 Active
US8017286B2 Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography Emerging Cross-Sectional Technologies 12 Active
US9343267B2 Method and system for dimensional uniformity using charged particle beam lithography Electricity 12 Active

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.