Exposure apparatus and device fabrication method
US7580116B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 7, 2008 |
| Grant date | Aug 25, 2009 |
| Priority date | — |
| Expiry date | Jul 7, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7092
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an exposure apparatus including a position detection apparatus that detects at least one of a position of a reticle and a position of a substrate. The position detection apparatus includes an optical member whose position can be changed, a photoelectric conversion device that receives light from a mark and outputs a detection signal, and a control unit that controls the position of the optical member based on information on a first evaluation value representing a symmetry of a waveform of the detection signal at each of a plurality of positions of the optical member and information on a second evaluation value representing a position shift of the mark detected upon changing a position of the mark in an optical axis direction of an optical system at each of the plurality of positions of the optical member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.