Photomask and method for forming pattern
US7582394B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 2004 |
| Grant date | Sep 1, 2009 |
| Priority date | — |
| Expiry date | Sep 15, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask includes, on a translucent substrate, three or more first light-shielding portions each in insular shape having a property of shielding exposure light and spaced equidistantly, a second light-shielding portion having a property of shielding the exposure light and formed to connect the adjacent first light-shielding portions, and first light-transmitting portions each in slit shape having a property of transmitting the exposure light and formed to be surrounded with the first and second light-shielding portions. The second light-shielding portion is formed to contain a point located equidistantly from the three or more first light-shielding portions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.