Charged-particle beam pattern writing method and apparatus and software program for use therein
US7589335B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 2, 2007 |
| Grant date | Sep 15, 2009 |
| Priority date | — |
| Expiry date | May 11, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A charged particle beam pattern writing apparatus in accordance with one preferred form of this invention includes an atmospheric pressure measuring unit which measures the value of an atmosphere air pressure, a coordinate value corrector which corrects three-dimensional (3D) coordinate values by use of the value of the air pressure measured, a deflection amount computing unit which calculates the deflection amount of a charged particle beam by using the 3D coordinate values corrected, an irradiator for irradiation of the charged particle beam, and a deflector for deflection of the charged particle beam based on the deflection amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.